Vacuum Installation VTT PLASMA M3 IS1 for drawing thin-film coverings of Al on substrates from Si
- Customer pickup,
- In detail
The vacuum VTT PLASMA M3 IS1 installation for drawing in vacuum of thin - film coverings of Al on substrates from Si in the magnetron way with preliminary cleaning with an ionic source.
Installation provides uniform drawing coverings on one lateral surface of a plate, 125 mm by 125 mm in size, plate thickness 220±20µm, at simultaneous loading of 300 products.
Vacuum installation has to be operated on production sites and in laboratories at a temperature of air from 17 to 25ºС, relative humidity of air from 40 to 75% and atmospheric pressure 84,0 * 10 ³ - 106,0 * 10³pa.
Use of installation for drawing decorative coverings on products from various materials is possible.
Yours faithfully, director of the enterprise
ph. mob: 375 (29) 6154641
e - mail: vactt@mail. ru
1. Internal size of a chamber: D=1060 mm, H=2370.
2. Limit residual vacuum of 9х10 - 4 Pas in a chamber.
3. The power consumed by installation:
- in the pumping mode - 12 kW;
- in the mode of cleaning and drawing a covering - to 60 kW. (depending on quantity of at the same time used sources)
STRUCTURE OF INSTALLATION.
|No. of a payment order||Name||Quantity.|
|1.||Magnetron source with the power supply unit.
Size of a target, mm
Power supply unit
- category current, move, And
2230 * 100 * 10.
- working zone, mm
- category current, And
- working tension, In
2100 * 70
|3.||Industrial equipment of drum type.
Quantity of at the same time loaded products of 125 * 125 mm in size (the option of industrial equipment directly under the customer's products is possible)
|4.||Forvacuum Okta 500 / HENA 300 (PFEIFFER) unit||1|
|5.||High - vacuum otkachny the module on the basis of the diffusive pump NVDM - 400||1|
|6.||Lock high - vacuum Du 400 air - controlled and possibility of a drosselirovaniye of pumping||1|
|7.||Heaters managements with the temperature of substrate, intra chamber with an opportunity, up to 400 ˚ Page.||4|
- PFEIFFER IKR 251
- PFEIFFER PKR 251
- PFEIFFER TPR 280
|8.||Control of thickness of coverings:
- Quartz controller of thickness.
- Control of resistance on a sample.
|8||System pneumatic on the basis of the SMC elements||1|
|9||System hydraulic on the basis of the SMC elements||1|
|10||System automatic supply of technological gases with a possibility of work along with 4 - 8 gases||1|